crwdns2933805:0crwdne2933805:0
crwdns2933797:0Andrew Bookholtcrwdnd2933797:0crwdne2933797:0
- crwdns2933769:0crwdne2933769:0
- crwdns2933771:0crwdne2933771:0
- crwdns2933801:0crwdne2933801:0
crwdns2933807:0crwdne2933807:0
- | [* black] MEMS devices require extremely complicated and sensitive manufacturing procedures to produce the kind of accuracy needed for reliable sensors. |
---|---|
+ | [* black] MEMS devices require extremely complicated and sensitive [link|http://en.wikipedia.org/wiki/Microelectromechanical_systems#MEMS_manufacturing_technologies|manufacturing procedures] to produce the kind of accuracy needed for reliable sensors. |
[* black] Most MEMS devices require a combination of deposition of a film layer, patterning to mask off areas of the deposited film to remain after etching, and etching to remove excess metallic film to achieve the final product. | |
[* black] The image you see in this step is an Invensense ITG3200 3-axis gyroscope. |