crwdns2933803:02crwdne2933803:0
crwdns2933797:0Jake Devincenzicrwdnd2933797:0crwdne2933797:0
crwdns2936043:0crwdne2936043:0 crwdns2933505:0crwdne2933505:0 Jake Devincenzi
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crwdns2933807:0crwdne2933807:0
| - | [* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) |
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| + | [* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) mill system. |
| [* black] The IBE is used to remove layers of semiconductor devices in a controlled and selective manner with very precise and planar results. | |
| [* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 which is fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) [http://en.wikipedia.org/wiki/CMOS|CMOS] process, making this an invaluable tool. | |
| - | [* black] tl;dr it's an ion blaster. |
| + | [* black] tl;dr it's an [http://images2.wikia.nocookie.net/__cb20110818230218/transformers/images/a/af/Prime-optimusprime-s01e06-ionblaster.jpg|ion blaster]. |