crwdns2933803:02crwdne2933803:0
crwdns2933797:0Jake Devincenzicrwdnd2933797:0crwdne2933797:0
crwdns2936043:0crwdne2936043:0 crwdns2933505:0crwdne2933505:0 Jake Devincenzi
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- crwdns2933771:0crwdne2933771:0
- crwdns2933801:0crwdne2933801:0
crwdns2933807:0crwdne2933807:0
| - | [* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) |
|---|---|
| - | [* black] The IBE is used to |
| - | [* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 which is fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS process, making this an invaluable tool. |
| - | [* black] tl;dr it's an ion blaster. |
| + | [* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) mill system. |
| + | [* black] The IBE is used to remove layers of semiconductor devices in a controlled and selective manner with very precise and planar results. |
| + | [* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 which is fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) [http://en.wikipedia.org/wiki/CMOS|CMOS] process, making this an invaluable tool. |
| + | [* black] tl;dr it's an [http://images2.wikia.nocookie.net/__cb20110818230218/transformers/images/a/af/Prime-optimusprime-s01e06-ionblaster.jpg|ion blaster]. |