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crwdns2933797:0Walter Galancrwdnd2933797:0crwdne2933797:0
crwdns2936043:0crwdne2936043:0 crwdns2933505:0crwdne2933505:0 Walter Galan
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| [* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) milling system. | |
| [* black] The IBE is used to delayer semiconductor devices in a controlled and selective manner with very precise and planar results. | |
| - | [* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS process, making this an invaluable tool. |
| + | [* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 which is fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS process, making this an invaluable tool. |
| [* black] tl;dr it's an ion blaster. |