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crwdns2933797:0David Hodsoncrwdnd2933797:0crwdne2933797:0

crwdns2936043:0crwdne2936043:0 crwdns2933505:0crwdne2933505:0 David Hodson

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-[* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (Ion Beam Etching) milling system.
+[* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) milling system.
[* black] The IBE is used to delayer semiconductor devices in a controlled and selective manner with very precise and planar results.
-[* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS Process, making this an invaluable tool.
-[* black] Yeah, it's an ion blaster.
+[* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS process, making this an invaluable tool.
+[* black] tl;dr it's an ion blaster.